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Fabrication of three-dimensional photonic crystals by interference lithography with low light absorption

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dc.contributor.author Miklyaev Y.V. en
dc.contributor.author Karpeev S.V. en
dc.contributor.author Dyachenko P.N. en
dc.contributor.author Pavelyev V.S. en
dc.date.accessioned 2018-10-16T06:53:44Z
dc.date.available 2018-10-16T06:53:44Z
dc.date.issued 2009
dc.identifier.issn 9500340
dc.identifier.uri http://dspace.susu.ru/handle/0001.74/20614
dc.description.abstract We report on the fabrication of polymer templates of photonic crystals by means of holographic (or interference) lithography. The grating is written in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. en]
dc.language.iso English
dc.relation.ispartof Journal of Modern Optics en]
dc.subject Absorption band en]
dc.subject He-Cd laser en]
dc.subject He-Cd lasers en]
dc.subject Interference lithography en]
dc.subject Orthorhombic lattices en]
dc.subject Polymer templates en]
dc.subject Porous structures en]
dc.subject SU-8 photoresist en]
dc.subject Three dimensional photonic crystals en]
dc.subject Absorption en]
dc.subject Crystal atomic structure en]
dc.subject Helium en]
dc.subject Lasers en]
dc.subject Light absorption en]
dc.subject Lithography en]
dc.subject Photoresistors en]
dc.subject Photoresists en]
dc.subject Silicon on insulator technology en]
dc.subject Surface treatment en]
dc.subject Photonic crystals en]
dc.title Fabrication of three-dimensional photonic crystals by interference lithography with low light absorption en
dc.type Article en]
dc.identifier.doi 10.1080/09500340902919469
dc.identifier.scopus https://www.scopus.com/inward/record.uri?eid=2-s2.0-67651202196&doi=10.1080%2f09500340902919469&partnerID=40&md5=5472b76aee6e9a663c9ab1c941f66093


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