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| dc.contributor.author | Dyachenko P.N. | en |
| dc.contributor.author | Karpeev S.V. | en |
| dc.contributor.author | Fesik E.V. | en |
| dc.contributor.author | Miklyaev Yu.V. | en |
| dc.contributor.author | Pavelyev V.S. | en |
| dc.contributor.author | Malchikov G.D. | en |
| dc.date.accessioned | 2018-10-16T06:37:41Z | |
| dc.date.available | 2018-10-16T06:37:41Z | |
| dc.date.issued | 2010 | |
| dc.identifier.isbn | 9780819481863 | |
| dc.identifier.issn | 0277786X | |
| dc.identifier.uri | http://dspace.susu.ru/handle/0001.74/20501 | |
| dc.description.abstract | We report on the fabrication of metallodielectric photonic crystals by means of interference (or holographic) lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric photonic crystals. © 2010 Copyright SPIE - The International Society for Optical Engineering. | en] |
| dc.description.sponsorship | The Society of Photo-Optical Instrumentation Engineers (SPIE);Brussels Photonics Team (B-PHOT);Brussels-Capital Region;Fonds Wetenschappelijk Onderzoek (FWO);International Commission for Optics (ICO);Ville de Bruxelles | en |
| dc.language.iso | English | |
| dc.relation.ispartof | Proceedings of SPIE - The International Society for Optical Engineering | en] |
| dc.subject | Absorption band | en] |
| dc.subject | Chemical coatings | en] |
| dc.subject | Chloroauric acid | en] |
| dc.subject | Gold Nanoparticles | en] |
| dc.subject | He-Cd lasers | en] |
| dc.subject | Interference lithography | en] |
| dc.subject | Metallo-dielectric photonic crystals | en] |
| dc.subject | Orthorhombic lattices | en] |
| dc.subject | Porous structures | en] |
| dc.subject | Reductants | en] |
| dc.subject | SU-8 photoresist | en] |
| dc.subject | Water solutions | en] |
| dc.subject | Coatings | en] |
| dc.subject | Crystal atomic structure | en] |
| dc.subject | Fabrication | en] |
| dc.subject | Gold | en] |
| dc.subject | Gold coatings | en] |
| dc.subject | Lithography | en] |
| dc.subject | Nanoparticles | en] |
| dc.subject | Photonic devices | en] |
| dc.subject | Photoresists | en] |
| dc.subject | Photonic crystals | en] |
| dc.title | Fabrication of three-dimensional metallodielectric photonic crystals by interference lithography | en |
| dc.type | Conference Paper | en] |
| dc.identifier.doi | 10.1117/12.853791 | |
| dc.identifier.scopus | https://www.scopus.com/inward/record.uri?eid=2-s2.0-79251506046&doi=10.1117%2f12.853791&partnerID=40&md5=73777ac4b5fe36e68679c5538f366124 | |
| dc.conference.name | Photonic Crystal Materials and Devices IX | en] |
| dc.conference.date | 12 April 2010 through 15 April 2010 |
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